Nanometrology, LLC seeks to become the leader in providing solutions
for high value metrology problems in the semiconductor industry.
Through six years of product testing and development, Nanometrology
has invented a new, leading edge approach to metrology of nanoscale
structures for the semiconductor industry. Its technology is covered
by over twenty patents--fifteen issued, over five pending--and is
comprised of high ticket proprietary software packages and hardware
reference samples. The commercial opportunity for the company's
products and know-how is significant.
Nanometrology solved the technical issues which are today at the
forefront of the semiconductor industry's most critical problem
area: feature edge definition. In order to solve this problem, it
is necessary to first calibrate the tool used for measurement (the
SEM or CD-SEM), and then with the properly calibrated SEM/CD-SEM,
perform precise and accurate metrology. Nanometrology's NANOCAL™
software calibrates the SEM/CD-SEM tool, while the CD-LER™
software performs precise and accurate critical feature measurements.
Using both products, measurement error is minimized leading to the
tightest SEM/CD-SEM metrology available today.