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Nanometrology, LLC seeks to become the leader in providing solutions for high value metrology problems in the semiconductor industry. Through six years of product testing and development, Nanometrology has invented a new, leading edge approach to metrology of nanoscale structures for the semiconductor industry. Its technology is covered by over twenty patents--fifteen issued, over five pending--and is comprised of high ticket proprietary software packages and hardware reference samples. The commercial opportunity for the company's products and know-how is significant.

Nanometrology solved the technical issues which are today at the forefront of the semiconductor industry's most critical problem area: feature edge definition. In order to solve this problem, it is necessary to first calibrate the tool used for measurement (the SEM or CD-SEM), and then with the properly calibrated SEM/CD-SEM, perform precise and accurate metrology. Nanometrology's NANOCAL™ software calibrates the SEM/CD-SEM tool, while the CD-LER™ software performs precise and accurate critical feature measurements. Using both products, measurement error is minimized leading to the tightest SEM/CD-SEM metrology available today.


_440 saw mill river road ardsley, ny 10502 tel: (914) 674-8649 email: info@nanometrologyllc.com